Interferential grating sensors for dimensional metrology

Focus: 
Metrology for Production

Grating interferometers are basic components of length and angle encoder measurement systems, which are widely used in industrial production control. The main objectives of this open position are a) development of new optical schemes for the use of grating interferometers in ultra-precision applications and b) simulations of the optical measurement process under different boundary conditions, both targeting at optimized grating interferometers and improved measurement uncertainties.

The development of improved grating interferometers requires understanding and simulation capability of the influence of geometrical deviations of optical elements, stray light, adjustment and environmental influences. Therefore, a mathematical simulation of the interference generation usable for different geometric designs and with parameters for alignment deviations has to be done in the first step.

The further development of the grating interferometers will focus on the miniaturization of the sensor for the use as high precision length and angle sensors in micro systems and the improvement of the accuracy of the encoders in ultra-precision applications. This also includes work on improved interferential sensors for existing gratings with larger periods.

Mentor/s: 
Bosse
Mentor/s: 
Fl├╝gge
Institution: 
PTB
Status: 
completed
Ph.D. student: 
Guan